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bias&ion cleaning
Usage
It is power supply to increase surface energy for enhancing adhesiveness and uniformity. It is used for Etching, Glow Discharge, and Bias. Depending on output wave, it is divided into DC supply and pulse supply. It is mainly applied to arch ion plating process and sputter process.
 
Product details
Model Power Specifications Type Remarks
Hercules 10 10 kW 1200V / 33.3A DC  
Hercules 20 20 kW 1200V / 50A DC  
EnerPulse 5 5 kW 800V / 12.5A (20~150kHz) Pulse  
EnerPulse 10 10 kW 800V / 25A (20~150kHz) Pulse  
EnerPulse 10MV 10 kW 1000V / 20A (10~50kHz) Pulse  
EnerPulse 10HV 10 kW 1400V / 20A (20~100kHz) Pulse  
* TBD (To be developed)
 
     
   
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