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The FloTron™ is a high-speed multi-channel active feedback process monitoring and control system designed for real time, in-situ control of low temperature plasma-based process. For example Reactive Magnetron Sputtering, Ion & Plasma processing, Reactive Electron Beam (EB) evaporation, Plasma Enhanced Chemical Vapour Deposition (PECVD), Plasma Etching.

The FloTron™ is a compact, complete, flexible and economical solution, which is convenient to use and can be readily integrated into new as well as existing vacuum systems.


The following four families of FloTron™ systems are available:
FloTron™
a multi-channel process control system featuring optical monitoring using a photo-diode with a narrow bandpass filter and analog/digital voltage sensor inputs and actuator outputs.
FloTron™ X
a multi-channel process control system featuring optical monitoring using a CCD spectrometer and analog/digital voltage sensor inputs and actuator outputs.
FloTron™ H
a multi-channel process control system which allows having both monitoring technologies, i.e. a photo-diode with a narrow bandpass filter and a fast CCD spectrometer, in one compact unit.
FloTron™ I
a multi-channel process control system which allows having both monitoring technologies, i.e. a photo-diode with a narrow bandpass filter and a fast CCD spectrometer, in one compact unit.

FloTron™ systems are available in three sizes -?3, 5 and 9 channel. Each channel can be used to control an actuator, such as Mass Flow Controller or a power supply.

Rugged and compact design
FloTron™ systems are reliable and robust. Thus minimal or no technical support/service required. Hardware and software developed for real industrial environments and processes.
Industrial communication interfaces
In addition to standard Ethernet and 4-wire RS485, well documented industrial interfaces for OEMs are available on all FloTron™ systems. PROFIBUS, PROFINET, Ethernet/IP, etc.
Automation of process set-up
Built-in automation routines to save time during process set-up.
Process support
Process know-how, expertise and training is available to you at every stage including remote and on-site support.
Clean User Interface and easy to tune process control algorithms with as little as two coeficients
High accuracy process control
provides required levels of stability and process-to-process repeatability. Especially useful in Reactive Magnetron Sputtering or any other processes prone to non-linear changes and drifts.
Process and plasma monitoring
Plasma based Physical Vapour deposition (Magnetron Sputtering, Electron Beam and Cathodic Arc Evaporation), Plasma Enhanced Chemical Vapour Deposition, Plasma Etching, etc.
Increase production rate
2-4 times typical for most materials in Reactive Magnetron Sputtering.
Improve plant economy
Sputter target lifetime -> less frequent target change, more coating produced from the same target volume (e.g. Si ...). Return of Investment (RoI) on a FloTron™ system is typically
Improve coating uniformity
Large area in-line or R2R web coating.
Large area in-line or R2R web coating.
Help reduce arcing and macro and micro defects
7+ models
7+ models to suit any industrial process or R&D application requirement.
from SMALL to LARGE
3, 5 and 9 channel FloTron™ systems to cover any system size or number of processes. Up to 7-zone reactive gas control is possible using just one FloTron™ system.
Economical 3-zone processing
5-channel FloTron™ systems are perfect for most 3 ?zone processing needs.
Fast proprietary control algorithms
PID and PDF. PID-based algorithm ? covers 99% of control engineers thus eliminating or reducing significantly the learning curve. PDF-based algorithm ? offers unique performance. Both are easy to tune.
Robust and reliable sensor assemblies
Standard optical plasma monitoring assemblies (OA-01), bespoke optical plasma monitoring assemblies. Remote Plasma sensor head (RP-01) for (reactive) gas p.p. monitoring (e.g. nitrogen, oxygen, hydrogen). RP-01 features robust design and fully integratetion with FloTron™.
Choice of optical monitor head designs
3 options for PVD and a design for PECVD.
HIPIMS P.E.M. sensor
Unique intelligent design providing excellent signal for a wide range of HIPIMS pulse frequencies. Will deal comfortably with pulses coming in at irregular intervals.
Software libraries
JAVA and .Net DLL libraries.
 
     
   
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