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Welcome at CCR Technology

Together with our Customers we are strong!

When we founded CCR Technology in the year 1995 and started to develop RF - Plasma Tech - nology we never thought that we would be facing the beginning of such a success story. We just followed up some technical ideas and wanted to add our simple contribution to the industrial plasma community, but today we know that we added a major contribution, probably the most efficient, flexibel and reliab-le currently existing plasma technology in the market. Nearly 500 Units in 39 countries in the world are currently operating in major markets like solar, precision optics, storage media, se-miconductor or wear and decorative coatings. Due to its superior performance the COPRA enables to achieve benchmarks like thinnest corrosion protecting carbon overcoats of 1.5nm for hard disks, high rate deposition of epitaxial grown crystalline Silicon or Germani-um of more than 1nm/sec, and high speed deposition of ideal oxides and nitrides. But not the COPRA alone caused this success. It only worked together with our company philosophy. We believe in the ethics as a gap in the market and treating our customer as partners with open access to our knowhow pool, motivated by the fact that only customers success is our success prove us right. That is the way we think to oprerate successfully in innovative markets where rapid success is demanded in order to gain the financial resources to create front end technology. We now working in the field of plasma since 25 years and we see our jobs as a gift when we are talking to our customers and help setting the course for the development of future technology.

Mile Stones in CCRs History

1955 Foundation of CCR Technology
1977 First Prototype of COPRA Plasma Source
2001 Worldewide patent applications
2004 100 COPRA units sold
2008 200 COPRA units sold
2009 New Building and Facilities at Camp Spich in Troisdorf
2012 400 COPRA units sold in 34 countries
2013 COPRA PECVD Lab installed at Camp Spich
2014 CCR generated first COPRA Gen-4 PECVD-Tool
2015 CCR completes the IS-Serie for Optical Assist with the IS200 a 200mm built in Source

The COPRA Plasma Technology

The COPRA Plasma Technology is based on inductively cou-pled 13.56MHz plasma excitation and its unique feature is the high degree of plasma excitation efficiency in combina-tion with scalability from RD to any kind of industrial pro-duction scale. The COPRA Technology unrivaled character-istics allows one to work with unchanging basic plasma pa-rameters. This means that your process result is not nega-tively affected by scaling in size and speed as long as the right power level is adjusted. The COPRA Technology, a po-tential candidate to be the new bench mark of industrial plasma standards.

     
   
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